Fabrication of nitride and oxide films using pulsed laser deposition technique

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Fabrication of nitride and oxide films using pulsed laser deposition technique

 

Author: Chan, Hon-kit Robin
Title: Fabrication of nitride and oxide films using pulsed laser deposition technique
Year: 2000
Subject: Thin films
Pulsed laser deposition
Hong Kong Polytechnic University -- Dissertations
Department: Multi-disciplinary Studies
Dept. of Applied Physics
Pages: v, 70 leaves : ill. ; 30 cm
Language: English
InnoPac Record: http://library.polyu.edu.hk/record=b1524929
URI: http://theses.lib.polyu.edu.hk/handle/200/4526
Abstract: High quality crystalline YBCO thin films have been fabricated by pulsed laser deposition method. Single phase and multi phases of YBCO films grown on silicon substrates have been obtained. Different multi-buffering layers have been used for facilitating the deposition of YBCO onto the Si substrate. Total two sets of buffering layers have been used. One set consists of Titanium Nitride (TiN) and Strontuim Titanium Oxide, SrTiO3 (STO) while another set consists of Titanium Nitride (TiN) and Magnesium Oxide (MgO). Based on these buffering layers, two different configurations of heterostructures have been obtained namely the YBCO/STO/TiN/Si and YBCO/MgO/TiN/Si. Both of them are found to behave differently at different deposition condition. At high deposition temperature (720) of TiN, single phase of YBCO are found to be deposited on both heterostructures, but when TiN was deposited at low temperature (580), it favored two phases of YBCO to be deposited on the heterostructure of YBCO/STO/TiN/Si. However, there is only one phase found at another heterostructure YBCO /MgO/TiN/Si.

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