| Author: | So, Chi-kuen |
| Title: | A study of the electrodeposition of iron by pulsed current |
| Degree: | M.Sc. |
| Year: | 1994 |
| Subject: | Iron plating Pulse plating Electroplating Hong Kong Polytechnic -- Dissertations |
| Department: | Multi-disciplinary Studies |
| Pages: | iv, 90 leaves : ill. (some col.) ; 30 cm |
| Language: | English |
| Abstract: | In electroplating with direct current (dc), one can only control the plating bath by a limited number of parameters. Recently, there is an increasing interest in the use of pulse plating by allowing current or voltage to be applied as almost any function of time. The idea of using pulsed current is to utilize the current characteristics rather than the chemistry to control the properties of deposits for certain applications. The current characteristics include the on-time, off-time and the pulsed current density. In the case of pulse reverse (PR) plating, the reverse pulsed current density can also be considered. In this project, iron was electroplated on brass substrate by the application of pulsed current. The microhardness of the deposits were examined by the use of microhardness tester. The current efficiency was also investigated by measuring the difference in weight before and after the plating process. It is found that the microhardness of the iron deposit is improved, the brightness of the surface is improved and the current efficiency is reduced with pulse plating. Satisfactory pulse conditions on electrodeposition of iron based on microhardness have also been established. The condition is on-time at 1ms, off-time at 8ms and average current density at 2.08A/dm2. |
| Rights: | All rights reserved |
| Access: | restricted access |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| b11829734.pdf | For All Users (off-campus access for PolyU Staff & Students only) | 5.24 MB | Adobe PDF | View/Open |
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