Full metadata record
|dc.contributor||Department of Applied Physics||en_US|
|dc.publisher||Hong Kong Polytechnic University||-|
|dc.rights||All rights reserved||en_US|
|dc.title||Laser etching and cleaning of material surfaces||en_US|
|dcterms.abstract||Laser etching and cleaning technology has been demonstrated to be a useful tool to rid the contaminants from a surface. The laser fluence required to remove the contaminants but without damaging the bulk substrate is critically depended on not only the laser wavelength but the absorption coefficient and the ablation threshold of the contaminants as well as the substrate materials. We have shown, in our studies, that for surface contaminants, such as polymeric coatings with a relatively low absorption coefficient at the laser wavelength, it is very difficult to produce good and effective cleaning. However, we have demonstrated that by introducing a metallic buffer layer, which has a much higher absorption coefficient, efficient and high quality cleaning of polymeric coatings such as Polyvinyl Alcohol (PVA), can be achieved.||en_US|
|dcterms.extent||iv, 62 leaves : ill. ; 29 cm||en_US|
|dcterms.LCSH||Lasers -- Industrial applications||en_US|
|dcterms.LCSH||Hong Kong Polytechnic University -- Dissertations||en_US|
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|b14390838.pdf||For All Users (off-campus access for PolyU Staff & Students only)||3.04 MB||Adobe PDF||View/Open|
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