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dc.contributorMulti-disciplinary Studiesen_US
dc.contributorDepartment of Applied Physicsen_US
dc.creatorLo, Yiu-kwong-
dc.publisherHong Kong Polytechnic University-
dc.rightsAll rights reserveden_US
dc.titleLaser etching and cleaning of material surfacesen_US
dcterms.abstractLaser etching and cleaning technology has been demonstrated to be a useful tool to rid the contaminants from a surface. The laser fluence required to remove the contaminants but without damaging the bulk substrate is critically depended on not only the laser wavelength but the absorption coefficient and the ablation threshold of the contaminants as well as the substrate materials. We have shown, in our studies, that for surface contaminants, such as polymeric coatings with a relatively low absorption coefficient at the laser wavelength, it is very difficult to produce good and effective cleaning. However, we have demonstrated that by introducing a metallic buffer layer, which has a much higher absorption coefficient, efficient and high quality cleaning of polymeric coatings such as Polyvinyl Alcohol (PVA), can be achieved.en_US
dcterms.extentiv, 62 leaves : ill. ; 29 cmen_US
dcterms.educationalLevelAll Masteren_US
dcterms.LCSHLasers -- Industrial applicationsen_US
dcterms.LCSHSurface preparationen_US
dcterms.LCSHSurface contaminationen_US
dcterms.LCSHHong Kong Polytechnic University -- Dissertationsen_US
dcterms.accessRightsrestricted accessen_US

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