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DC FieldValueLanguage
dc.contributorMulti-disciplinary Studiesen_US
dc.contributorDepartment of Applied Physicsen_US
dc.creatorChan, Wai-keung-
dc.identifier.urihttps://theses.lib.polyu.edu.hk/handle/200/3874-
dc.languageEnglishen_US
dc.publisherHong Kong Polytechnic University-
dc.rightsAll rights reserveden_US
dc.titleCarbon implanted titanium nitride filmen_US
dcterms.abstractTernary materials consisting of titanium, carbon and nitrogen were prepared by implanting carbon into TiN film coated on stainless steel substrate. A MEtal Vapor Vacuum Arc (MEVVA) was used for carbon ion implantation. Some selected samples were annealed. The structure of the C-implanted TiN films was then analyzed using X-ray diffractometer (XRD), optical microscopy and X-ray photoelectron spectrum (XPS). Pulsed carbon ion beam implantation generated cracks on the sample surface, especially for those received high dosage implantation. It was suggested that rapid heating and cooling occur during implantation, which induce thermal shock leading to different thermal expansion between TiN film and stainless steel substrate. The cracks were thus produced. The sample surface becomes rough if higher dosage of carbon implanted. Even after annealing at 400 C, the cracks cannot be removed, and the film surface remains rough. However, fewer cracks are formed, and smoother surface can be achieved if pulsed carbon ion beam with smaller beam current and lower frequency was used during implantation. XRD results indicated that new phases of Ti-C-N may be formed by high beam current implantation. XPS results indicated that graphite structure, and possibly diamondlike structure were formed by high dosage carbon implantation. Ti-N and Ti-C phases coexisted in the solid, and were about stoichiometric. The existence of a C-N phase was also evident. The C-N phase was found to contain less than 33 at. % nitrogen, below the level required to form the hypothetical 帣-C3N4 phase.en_US
dcterms.extentviii, [85] leaves : ill. ; 31 cmen_US
dcterms.isPartOfPolyU Electronic Thesesen_US
dcterms.issued1998en_US
dcterms.educationalLevelAll Masteren_US
dcterms.educationalLevelM.Sc.en_US
dcterms.LCSHThin filmsen_US
dcterms.LCSHProtective coatingsen_US
dcterms.LCSHCoating processesen_US
dcterms.LCSHThin films -- Surfacesen_US
dcterms.LCSHSurface chemistryen_US
dcterms.LCSHHong Kong Polytechnic University -- Dissertationsen_US
dcterms.accessRightsrestricted accessen_US

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