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DC FieldValueLanguage
dc.contributorMulti-disciplinary Studiesen_US
dc.contributorDepartment of Applied Physicsen_US
dc.creatorNg, Chi-fuk Astric-
dc.identifier.urihttps://theses.lib.polyu.edu.hk/handle/200/417-
dc.languageEnglishen_US
dc.publisherHong Kong Polytechnic University-
dc.rightsAll rights reserveden_US
dc.titleThermoelectric power of thin filmsen_US
dcterms.abstractThermocouple device in its simplest form can be used for temperature measurements. Thermoelectric power, which involves the measurable quantities of temperature difference and voltage, is the topic to be studied on semiconducting thin film materials. Roughly speaking, the concepts behind thermocouple and thermoelectric power are inter-related. A thermoelectric voltage dV will appear in an open circuit consisting of two different conductors when there is a temperature difference dT between their ends. The ratio of dV to dT is what we called the thermoelectric power. This is also called the Seebeck coefficient of a given material. This project is to measure the thermoelectric power of thin films. The transport properties can then be studied. For the sample measurements, the selected thin films include the silicon wafer semiconducting films and the boron thin films. The measurement is conducted under a high vacuum condition. The sample is subjected to a temperature difference across its two ends, and any thermal voltages that built up will be recorded. The use of a high vacuum environment during the measurement can minimize the sample, in which it is in thin film format, from easily oxidized, especially at high temperature condition. The first part of practical work is to design and construct a vacuum system. The second part of practical work will involve integrating all the necessary measuring equipment onto the vacuum system. Measurement and data collection of sample's thermoelectric properties will be conducted by using this vacuum system. This will be the third part of practical work in this project. Apart from the study of thermoelectric properties of thin film materials, this project is also an interesting topic to study regarding the vacuum techniques to be learned and applied during the setup of the vacuum system.en_US
dcterms.extentiii, 96 leaves : ill. ; 30 cmen_US
dcterms.isPartOfPolyU Electronic Thesesen_US
dcterms.issued1999en_US
dcterms.educationalLevelAll Masteren_US
dcterms.educationalLevelM.Sc.en_US
dcterms.LCSHThin films -- Thermal propertiesen_US
dcterms.LCSHThermoelectricityen_US
dcterms.LCSHHong Kong Polytechnic University -- Dissertationsen_US
dcterms.accessRightsrestricted accessen_US

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Please use this identifier to cite or link to this item: https://theses.lib.polyu.edu.hk/handle/200/417