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Department:Faculty of Construction and Environmenten_US
Author:Dai, Jiannanen_US
URI:https://theses.lib.polyu.edu.hk/handle/200/9536-
Language:Englishen_US
Title:Formation of oxygenated volatile organic compounds from the dark ozonolysis of isopreneen_US
Abstract:Secondary organic aerosol (SOA) has an important impact on air quality, human health and climate change. In recent years, the emerging smog chamber experiments provided plenty of reliable reference and parameters for studying on the SOA formation mechanism. In this work, a new smog chamber was set up at the Hong Kong Polytechnic University (PolyU), and a series characterizations including measurement of gaseous and particular species wall loss rate and evaluation of other mechanism were underwent. At the same time, a series of experiments were carried out to investigate the major products of the dark ozonolysis of isoprene, and the factors on the yields and reaction rate of this process. This study found that oxygenated volatile organic compounds(OVOCs) containing one to four carbon atoms are the main gaseous phase products, which are the important factors for the formation of SOA. Furthermore, select NO₂ concentration and the ratio of isoprene to O₃ as the controlled variable to evaluate their impacts on the formation of OVOCs. The experimental results state that NO₂ has an inhibitory effect on the generation of OVOCs. The higher NO₂ concentration is, the lower OVOCs yields are. In addition, the ratio of isoprene to O₃ affects the reaction rate of isoprene. As the concentration ratio of O₃ goes up, the reaction rate of isoprene increases.en_US
Pages:vi, 62 pages : color illustrationsen_US
Year:2017-
Degree:M.Sc.en_US
Degree:All Masteren_US
Subject:Hong Kong Polytechnic University -- Dissertationsen_US
Subject:Aerosolsen_US
Subject:Organic compounds -- Environmental aspectsen_US
Subject:Atmospheric aerosolsen_US
Subject:Atmospheric chemistryen_US
Access:restricted access-

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Please use this identifier to cite or link to this item: https://theses.lib.polyu.edu.hk/handle/200/9536