|Title:||Laser etching and cleaning of material surfaces|
|Subject:||Lasers -- Industrial applications|
Hong Kong Polytechnic University -- Dissertations
Department of Applied Physics
|Pages:||iv, 62 leaves : ill. ; 29 cm|
|Abstract:||Laser etching and cleaning technology has been demonstrated to be a useful tool to rid the contaminants from a surface. The laser fluence required to remove the contaminants but without damaging the bulk substrate is critically depended on not only the laser wavelength but the absorption coefficient and the ablation threshold of the contaminants as well as the substrate materials. We have shown, in our studies, that for surface contaminants, such as polymeric coatings with a relatively low absorption coefficient at the laser wavelength, it is very difficult to produce good and effective cleaning. However, we have demonstrated that by introducing a metallic buffer layer, which has a much higher absorption coefficient, efficient and high quality cleaning of polymeric coatings such as Polyvinyl Alcohol (PVA), can be achieved.|
|Rights:||All rights reserved|
Files in This Item:
|b14390838.pdf||For All Users (off-campus access for PolyU Staff & Students only)||3.04 MB||Adobe PDF||View/Open|
As a bona fide Library user, I declare that:
- I will abide by the rules and legal ordinances governing copyright regarding the use of the Database.
- I will use the Database for the purpose of my research or private study only and not for circulation or further reproduction or any other purpose.
- I agree to indemnify and hold the University harmless from and against any loss, damage, cost, liability or expenses arising from copyright infringement or unauthorized usage.
By downloading any item(s) listed above, you acknowledge that you have read and understood the copyright undertaking as stated above, and agree to be bound by all of its terms.
Please use this identifier to cite or link to this item: